摘要
通过考虑互相关联的光学和工艺参数 ,设计了 3～ 5 μm红外 12 8× 12 8硅衍射微透镜阵列 .阵列中微透镜的孔径为 5 0 μm,透镜 F数为 f/ 2 .5 ,微透镜阵列的中心距为 5 0 μm.采用多次光刻和离子束刻蚀技术在硅衬底表面制备衍射微透镜阵列 .对实际的工艺过程和制备方法进行了讨论 ,对制备出的 12 8× 12 8硅衍射微透镜阵列的光学性能和表面浮雕结构进行了测量 .
diffractive microlens array was designed by considering the correlative optical and processing parameters for 3—5μm wavelength range with a microlens diameter of 50μm. The lens f number and array pitch are f /2.5 and 50μm, respectively. The diffractive microlens arrays were fabricated on the surface of Si substrates by successive photolithography and Ar + ion beam etching technique. The practical processes and fabrication method were discussed. The optical characteristics and the surface relief structure of the 128×128 Si diffractive microlens array were measured.
出处
《红外与毫米波学报》
SCIE
EI
CAS
CSCD
北大核心
2000年第3期197-200,共4页
Journal of Infrared and Millimeter Waves
基金
国家高科技 863- 4 0 9直属主题资助项目&&
