摘要
采用喷雾电化学放电加工方法对单晶硅、光学玻璃和氧化铝陶瓷三种难导电硬脆材料进行试验研究,阐述了加工原理,构建了传热物理模型。通过分析加工放电波形和表面微观形貌,得出了难导电硬脆材料的加工蚀除方式。研究表明,对于硅等半导体材料,主要依靠电化学腐蚀、电化学放电和化学溶解进行综合蚀除;对于光学玻璃等易软化的绝缘材料,主要依靠电化学放电形成的局部高温进行软化,并进行化学溶解蚀除;对于氧化铝陶瓷等高熔点绝缘材料,电化学放电通常只能产生软化层,再由机械方法实现延性方式去除。
Three kinds of difficult--to--conductive hard and brittle materials such as single crystal silicon, optical glass and A12 03 ceramic were researched with mist--jetting electrochemical discharge method, the machining principle was expounded, and the heat transfer physical model was constructed. Machining discharge waveforms and surface microstructures were analyzed to get the erosion methods of difficult--to--conductive hard and brittle materials. The research results show that, the erosion methods are electrochemical corrosion, electrochemical discharge and chemical dissolution for semiconductor such as silicon; local high temperature generated by electrochemical discharge makes soften layer and chemical dissolution reactes for the insulating materials which is easy to soften such as optical glass; and for the insulating materials with high melting--point, electrochemical discharge can only make soften layer which then removed by mechanical way through ductile regime method.
出处
《中国机械工程》
EI
CAS
CSCD
北大核心
2013年第9期1214-1219,共6页
China Mechanical Engineering
基金
国家自然科学基金资助项目(51175256
51205197)
江苏省自然科学基金资助项目(BK2011732)
航空科学基金资助项目(2011ZE52060)
江苏省博士后基金资助项目(1002009C)
关键词
难导电材料
喷雾
电化学
放电
蚀除方式
difficult-- to-- conductive material
mist--jetting
electrochemical
discharging
erosion method
