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基片温度对脉冲激光沉积CN_x薄膜的组织结构和摩擦学性能的影响 被引量:2

Growth and Characterization of Pulsed Laser Deposited CN_x Coatings
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摘要 采用脉冲激光烧蚀氮化碳薄膜靶,在室温至450℃基片温度下制备了CNx薄膜。利用扫描电镜、X射线衍射仪、X射线光电子谱仪和拉曼光谱仪等对薄膜的形貌、结晶性和结合键状态进行了表征。采用球-盘式摩擦仪测试了薄膜在大气中(相对湿度60%~62%)的摩擦磨损性能。结果表明:所得CNx薄膜均呈非晶状态,表面形貌与基片温度无关。随着基片温度的升高,薄膜含氮量由原子分数25.3%下降至21.2%,膜中sp3C-C键的含量增加且在300℃时达到最高,N-sp3C键的含量下降且在150℃时最高;拉曼谱中ID/IG比值上升,G峰蓝移且半高宽下降,薄膜结构有序度升高-石墨化程度增加;薄膜的摩擦系数从0.23下降至0.13,磨损率从3.0×10-15m3N-1m-1上升至9.3×10-15m3N-1m-1。 The CNx coating was grown by pulsed laser deposition on Si( 111)substrates. The influencing film growth factors were experimentally studied. The microstructures and mechanical properties of the CNx coating were characterized with X-ray diffraction, x-ray photoelectron spectroscopy, Raman spectroscopy, scanning electron microscopy, and conven- tional mechanical probes. The results show that the substrate temperature strongly affects the N-content and mechanical properties of the amorphous CN~ coatings. For instance, as the substrate temperature increased, the N-content decreased from 25.3% to 21.2% ,and the fraction of sp3 C-C bond increased,peaking at 300~C. The friction coefficient decreased from 0.23 to 0.13,and the wear rate increased from 3.0x 10-15 m3N-tm-1 to 9.3 x 10-15 m3N-lm-1.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2013年第4期371-376,共6页 Chinese Journal of Vacuum Science and Technology
基金 浙江自然科学基金项目(Y4110645)
关键词 薄膜 氮化碳 摩擦与磨损 X射线光电子谱 拉曼光谱 脉冲激光沉积 Thin film, Carbon nitride, Friction and wear, X-ray photoelectron spectroscopy, Raman spectroscopy, Pulsedlaser deposition
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