摘要
利用金属有机气相沉积 (MOCVD)方法 ,在经过预沉积和表面研磨处理的Al2 O3 陶瓷基片上制备多晶钼膜 .通过该薄膜的表面形态及其结构的观察分析 ,讨论了该薄膜的形成机制 .结果表明 ,基片的表面形态是影响薄膜生长成核机理的重要因素 ,基底表面的状态设计是提高成核密度 。
Deposition of Molybdenum films on scratched Al 2O 3ceramic substrate pre deposited at low temperature has been realized.The mechanism of CVD Molybdenum films is discussed by the analysis of surface state and structure. It showed that the mechanism is influenced by the state and structure of substrates. Therefore,the design of surface state of substrate is main effect by which nucleation density can be enhanced and good Molybdenum films can be obtained.
出处
《西南师范大学学报（自然科学版）》
CAS
CSCD
北大核心
2000年第1期28-32,共5页
Journal of Southwest China Normal University(Natural Science Edition)
基金
国家教育部攻关项目资助
关键词
MOCVD
成核机理
表面形态
薄膜
MOCVD
mechanism of nucleation
surface state
pre deposition
