摘要
以正硅酸乙酯(TEOS)为有机硅源,采用溶胶-凝胶技术,通过调节添加剂控制溶胶溶液性能,然后分别用光固化和传统电阻炉固化两种不同的热处理方案,制备出低折射率SiO2光学减反薄膜。分别采用椭偏仪、扫描电镜等对所制备薄膜的结构、物性进行研究。研究结果表明:光固化比传统电阻炉固化减反膜折射率低。
Anti-reflective SiO2 thin films with low refraction index were prepared via traditional sol-gel process followed by light or furnace heat treatment. The microstructure of SiO2 particles in the sol was exactly controlled by adopting appropriate organic dopant and silane coupling agent in the preparation process. The films were then characterized by spectrophotometer and scanning electronic microscope （SEM）. The experimental results show that the thin film by light heating has lower refractive index of SiO2 thin film than that by traditional furnace treatment.
出处
《材料科学与工程学报》
CAS
CSCD
北大核心
2013年第3期461-463,共3页
Journal of Materials Science and Engineering
基金
国家高技术产业计划项目资助项目(发改办高技072490)
河南省基础与前沿基础研究资助项目(072300410310)
