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室温下Ba_(0.67)Sr_(0.33)TiO_3薄膜的射频磁控溅射法制备及其电学性能研究

Preparation of Ba_(0.67)Sr_(0.33)TiO_3 film by radio frequency magnetron sputtering method at room temperature and its dielectric properties
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摘要 采用磁控溅射技术在室温下制备Ba0.67Sr0.33TiO3薄膜,通过引入LaNiO3作为缓冲层以及对退火工艺的研究,采用两步法快速退火工艺与常规退火工艺结合的方式获得了致密并具有良好电学性能的钛酸锶钡薄膜.X线衍射分析表明室温情况下获得的薄膜是非晶态,需要通过后续的退火处理才能获得晶化的薄膜,采用快速退火与常规退火相结合工艺,即以40℃/s的升温速率,先升温到850℃,再降温到450℃保温180s,然后再在500℃常规退火3h,可使室温下溅射的呈非晶态的BST薄膜晶化形成具有完全钙钛矿结构的BST薄膜,薄膜致密,晶粒大小均匀.室温下所制备的BST薄膜在100Hz时的介电常数约为300,介电损耗约为0.03,具有铁电性. Ba0.67Sr0.33TiO3 thin films were prepared on LaNiO3/SiO2/Si substrate by radio frequency magnetron sputtering technology at room temperature.After sputtering,the Ba0.67Sr0.33TiO3 thin films were annealed by two-step rapid thermal annealing and traditional annealing.The microstructure and the electric properties of the as-prepared Ba0.67Sr0.33 TiO3 thin films were studied.The results showed that the two-step rapid thermal annealing and traditional annealing processing was beneficial to the sufficient crystallization and satisfied electrical properties.
作者 杜层虎 陈潇洋 徐樽平 严东旭 朱建国 余萍
机构地区 四川大学材料科学与工程学院
出处 《湖北大学学报（自然科学版）》 CAS 2013年第3期332-335,共4页 Journal of Hubei University：Natural Science
基金 国家自然科学基金云南联合基金(u0837605)资助
关键词 射频磁控溅射 钛酸锶钡薄膜 室温沉积 radio-frequency magnetron sputtering BaSrTiO3 thin film room temperature deposition
分类号 TB324.1 [一般工业技术—材料科学与工程]
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湖北大学学报（自然科学版）
2013年 第3期

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