摘要
本文以水玻璃为硅源,利用超临界CO2(sc CO2)技术制备出超细SiO2粉体,研究了压力、温度对超细SiO2粒子粒径和Zeta电位的影响,采用Zeta电位及激光粒度分析仪、X射线衍射(XRD)、自动吸附仪等测试方法对粉体的结构和性能进行了分析表征。结果表明:当压力为8 MPa,温度为50℃时,所得超细SiO2粒子粒径分布较窄且平均粒径最小,为472.9 nm,且Zeta电位取得较小值,为-55.68 mV;所得超细SiO2粒子属于非晶态,且与市售的T36-5 SiO2粒子相比,其孔结构更加致密。
In this paper, sodium silicate was used as silica source and supercfitical fluid technology was carried out to prepare ultrafine SiO2 particles. The effects of pressure and temperature on the particle size and zeta potential of uhrafine SiO2 particles were studied, respectively. Zeta potential and laser particle size analyzer, X-ray diffracmeter （XRD） and automatic adsorption instrument were employed to characterize the structure and properties of ultrafine SiO2 particles. The results showed that the minimum mean diameter of silica particles is 472. 9 nm and the Zeta potential is - 55. 68 mV when the corresponding pressure and temperature is 8 MPa and 50 ℃, respectively. The uhrafine SiO2 particles exhibit amorphous state and compared with the purchased T36-5 SiO2 particles, its pore structure is denser.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2013年第8期1712-1717,共6页
Journal of Synthetic Crystals
基金
国家科技支撑计划(2011BAA04B04)
生物质材料教育部工程研究中心项目(09zxbk09)
关键词
超临界二氧化碳
超细二氧化硅
制备
supercritical carbon dioxide
ultrafine silica
preparation.
