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Glass homogeneity effect on wavefront aberration in lithography projection lens

Glass homogeneity effect on wavefront aberration in lithography projection lens
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摘要 Analysis of glass homogeneity To improve analysis accuracy, using the attaching interferometric we establish the three-dimensional data model neglects body distribution. gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking. Analysis of glass homogeneity To improve analysis accuracy, using the attaching interferometric we establish the three-dimensional data model neglects body distribution. gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.
出处 《Chinese Optics Letters》 SCIE EI CAS CSCD 2013年第9期25-27,共3页 中国光学快报(英文版)
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