期刊文献+

厚钛过渡层缓解铜基上热丝CVD金刚石薄膜内应力 被引量:4

Thick Titanium Interlayer Remitting Stress in Diamond Films Deposited on Copper Substrate by Hot Filaments Chemical Vapor Deposition
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摘要 以紫铜为基体,在紫铜上先采用磁控溅射技术镀一层金属钛,再以H2和CH4作为反应气体,采用热丝化学气相沉积法(HFCVD)在钛过渡层上合成金刚石薄膜,研究不同钛过渡层厚度对金刚石薄膜质量的影响。利用X射线(XRD)、激光拉曼光谱(Raman)、扫描电镜(SEM)分析薄膜的结构、成分和表面形貌,用能谱仪(EDS)对热处理前后样品的表面进行了元素分析。研究发现,当钛过渡层厚度为3μm时,生成的金刚石薄膜受到较大内应力而发生破裂;当钛过渡层厚度为25μm时,金刚石薄膜质量较好,薄膜受一定内应力,但没有破裂;850℃左右保温热处理12 h,铜原子与钛原子发生了扩散。 Diamond films were deposited on metal copper substrate with a buffer layer of titanium with the mixture gas of methane and hydrogen by hot filaments chemical vapor deposition (HFCVD). Effects of different thickness of titanium layer on diamond films by HFCVD were investigated. The components of films were investigated using X-ray diffraction (XRD) and laser Raman spectrum, and the surface morphology and structure were observed by scanning electron microscopy (SEM). The surface element of samples processed by heat treatment were analyzed using energy disperse spectroscopy (EDS). The results show that when the thickness of titanium layer is 3 μm, the diamond film breaks down due to large internal stress. When the thickness of titanium increases to 25 μm, the diamond film is good and don' t break down with the existence of internal stress in the membrane. The diffusion between copper and titanium happens when the sample is processed by heat treating at 850 ℃ for 12 hours.
出处 《表面技术》 EI CAS CSCD 北大核心 2013年第5期19-23,共5页 Surface Technology
基金 广东省科技计划项目(2011A081301003)
关键词 金刚石薄膜 钛过渡层 内应力 热丝化学气相沉积 diamond films titanium interlayer internal stress hot filaments chemical vapor deposition
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参考文献12

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