摘要
建立一个模拟薄膜三维生长的蒙特卡罗模型,模型中Ehrlich-Schwoebel(ES)势垒随台阶高度不同而变化。模拟结果表明:考虑ES势垒时,随着基底温度升高和沉积速率的降低,薄膜的粗糙度越来越低,成膜质量越好;一层ES势垒和层间势垒差对薄膜生长机制和成膜质量都有影响。
A 3-dimensional thin film is simulated in Monte Carlo method. In this mode, Ehr- lich-Schwoebel barrier changes with the step height. Two results are concluded. When consider- ing Ehrlich-Schwoebel barrier, the film becomes smoother with the substrate temperature rising and deposition rate decreasing; One layer Ehrlich-Schwoebel barrier and the barrier difference will influence the growth process and the quality of thin film.
出处
《固体电子学研究与进展》
CAS
CSCD
北大核心
2013年第5期458-461,465,共5页
Research & Progress of SSE
基金
国家自然科学基金资助项目(61271271)
关键词
薄膜
ES势垒
台阶高度
粗糙度
覆盖率
thin film
Ehrlich-Schwoebel barrier
step height
roughness
coverage rate
