摘要
以拓展的三高斯邻近效应函数为基础,利用空间图形密度方法对电子刻蚀中的邻近效应进行修正,并对该方法的原理及实现步骤进行了较为详细的介绍.通过和传统的邻近函数为基础得到的修正结果相比,经过拓展后的邻近函数有着更好的修正效果.
The area density map method based on three Gaussian proximity function was used to correct proximity effect respectively, and the principle of this method and steps were introduced in detail. Through com- paring correction results based on the new proximity function with the results based on the conventional proximity function, it is proved that this method is better.
出处
《佳木斯大学学报（自然科学版）》
CAS
2013年第6期957-960,共4页
Journal of Jiamusi University：Natural Science Edition
关键词
邻近效应
邻近函数
电子束刻蚀
高斯函数
proximity effect
proximity function
electron beam lithography
Gaussian function
