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氮气氛下金刚石薄膜生长过程中的光发射谱研究 被引量:4

Optical Emission Spectroscopy for Hot Filament Diamond Growth Process with Nitrogen Addition
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摘要 利用原位光发射谱对衬底附近的化学气相性质进行了研究.研究表明,氮气的引入使得金刚石生长的气相化学和表面化学性质发生了很大变化.含氮基团的萃取作用提高了金刚石表面氢原子的脱附速率,从而提高了金刚石膜的生长速率.而含氮基团的选择吸附使金刚石(100)取向变得化学糙化,这种化学糙化使得(100)晶面生长速率远大于其它晶面,最终使金刚石薄膜呈现(100)织构.还利用化学气相沉积方法研究了氮气浓度对金刚石生长的影响,结果与光发射谱分析是一致的. Optical emission spectra were applied to detect the chemical radicals in the system. It is shown that the additional nitrogen makes the chemical radicals and surface activity of diamond films change tremendously, Nitrogenous species abstract the atomic hydrogen on the diamond surface and speed up the desorption fate of H, so as to promote the diamond films deposition. Further more, the selective absorption of nitrogenous species causes the (100) facets chemical roughening, which makes the growth rate of (100) facet higher than that of other Facets and leads to the presence of (100) textured diamond films. The effects of nitrogen addition in CH4/W-2 gas mixtures on morphology, quality and growth rate of polycrystalline diamond films prepared by hot filament chemical vapor deposition (HFCVD) were also studied. The results agree with the analysis of the optical emission spectra.
出处 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2001年第1期81-86,共6页 Journal of Inorganic Materials
基金 八六三计划新材料领域资助项目!(715-002-0032) 国家自然科学基金资助!项目(59771022)
关键词 热丝CVD 光发射谱 含氮基团 金刚石薄膜生长 hot filament CVD optical emission spectra nitrogenous radicals diamond growth
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参考文献2

  • 1王季陶,金刚石低压气相生长的热力学耦合模型,1998年,129页
  • 2Cao G Z,J Appl Phys,1996年,79卷,1357页

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