摘要
以碳纤维毡为基材,优化了采用磁控溅射技术在其表面沉积纳米铜薄膜的工艺参数。运用正交试验分析方法,选取沉积时间、溅射功率和工作压强3个参数为因素,分析了各因素对碳纤维毡的电磁屏蔽效能和导电性能的影响。实验表明:磁控溅射铜薄膜后,碳纤维毡的电磁屏蔽效能提高了116.25%,导电性能提高了45.81%。;碳纤维毡表面溅射沉积铜薄膜的最佳工艺方案为:沉积时间50min,工作压强0.4Pa,溅射功率80W。
The optimization of magnetron sputtering program of depositing nanocopper thin films on nonwovens of carbon fiber, which were selected as the basic materials,was conducted. The depositing l.ime, sputtering power and working pressure were chosen as the factors according to the orthogonal experimental analysis method, and the effect of each on the electromagnetic shiel ding efficiency and the square resistance of nonwovens was analysed. It was proved that the electromagnetic shielding efficiency was increased by 116. 25%, and the electric conductivity increased 45.81%. The depositing time 50min, working pressure 0. 4Pa and sputtering power 80W were obtained as the optimum program for magnetron sputtering of nanocopper.
出处
《化工新型材料》
CAS
CSCD
北大核心
2014年第2期72-74,共3页
New Chemical Materials
基金
教育部长江学者和创新团队发展计划(IRT1135)
关键词
碳纤维毡
纳米铜薄膜
磁控溅射
工艺优化
电磁屏蔽
nonwoven of carbon fiber, nanocopper thin film, magnetron sputtering, optimization program, electromagnetic shielding
