摘要
为了改善普通钛合金TC4的表面生物医学性能,采用磁控溅射的方法在TC4表面制备微纳米Nb薄膜,研究不同功率(46,98.5,144,205.8 W)对制备微纳米化Nb膜的沉积速率、晶体结构、晶粒尺寸、应力、表面形貌及表面硬度的影响规律。结果表明,在气压为0.5 Pa、温度室温的情况下,溅射功率200 W时,制备的Nb薄膜具有晶粒尺寸适当、应力小、表面粗糙度低和较高硬度等综合性能较好的特点。
The surfaces of the titanium alloy, TC4, were modified with the Nb coatings synthesized by DC mag-netron sputtering to improve its biomedical properties. The impacts of the deposition conditions, such as the sputtering power, pressure, and deposition rate, etc., on the microstructures and mechanical properties were evaluated. The mi-cro-nano Nb coatings were characterized with X-ray diffraction, atomic force microscopy, and conventional mechanical probes. The results show the sputtering power has a major impact on Nb-coating＇s quality. For example, synthesized at a sputtering power of 200 W, a pressure of 0.5 Pa, and room temperature, the fairly smooth and compact Nb coatings display some improved properties, including smaller grain sizes and stress, higher surface hardness and corrosion resis- tance, and better biomedical perfomance.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2014年第4期358-362,共5页
Chinese Journal of Vacuum Science and Technology
关键词
NB
生物医学
磁控溅射功率
晶体结构
应力
Nb, Biomedical properties, Magnetron sputtering power, Crystal structure, Stress
