摘要
镀膜靶材作为物理气相沉积方法制备薄膜的沉积源材料,广泛应用于机械加工、半导体集成电路、磁记录和平面显示等产业中。在机械加工产业中,硬质涂层提高了部件的机械加工效率、延长了部件的使用寿命,具有很高的经济效益。物理气相沉积过程中,镀膜靶材以溅射或弧蒸发的方式制备硬质涂层,其质量好坏将直接影响硬质涂层的物理及力学性能,是涂层技术的重要组成部分。本文对用于制备硬质涂层镀膜靶材的种类、技术要求、制备方法和研究现状做了概述。
Coating target materials,as raw materials of films made by physical vapor deposition,are widely used in machining processing,semiconductor integrated circuit,magnetic recording and flat pannel display industry,etc.In machining processing industry,hard coatings can increase the efficiency of the machining processing,extend the service life of components and have a very high economic benefit.In the process of physical vapor deposition,coating target materials are used in preparation of the hard coatings with the way of sputtering or arc evaporation,which quality directly affects the physical and mechanical properties of the hard coatings,The species,technical requirements,preparation methods and development direction of the sputtering target materials used in hard coatings were introduced in this paper.
出处
《粉末冶金工业》
CAS
北大核心
2014年第2期38-43,共6页
Powder Metallurgy Industry
基金
国家自然科学基金资助项目(51275323)
关键词
硬质涂层
靶材
溅射
弧蒸发
hard coatings
target materials
sputtering
arc evaporation
