期刊文献+

一种大入射角容差宽带薄膜偏振器 被引量:3

A broadband thin-film polarizer with large angle tolerance
下载PDF
导出
摘要 通过组合长波通和短波通膜堆的方法,设计并制备了一种大入射角容差宽带薄膜偏振器。该薄膜为HfO_2/SiO_2结构,采用无离子束辅助的电子束蒸发工艺,蒸发金属铪和SiO_2制得。对该膜的透射率光谱、激光损伤阈值和形貌进行了研究,结果显示其不仅在1044~1084 nm波段内都具有很高的对比度,而且在1064 nm波长、53°~60°的入射角范围内具有很大的消光比和激光损伤阈值,且损伤特性基本不随入射角变化。该偏振器的P光损伤阈值约为20 J/cm^2,损伤主要由基板与薄膜界面处的纳米级缺陷所引起;S光损伤阈值约为45 J/cm^2,损伤主要由激光辐照下薄膜表面的等离子烧蚀现象引起。 A kind of broadband thin film polarizer with large angle tolerance has been designed and fabricated. This polarizer has high extinction ratio in the incidence angle range of 53°-60°and wavelength region of 1044-1088 nm. The coating design is H/ L type multilayer, and employs HfO2 and SiO2 as the high and low refractive index materials. The electronic beam evaporation method is employed to evaporate the metal hafnium and SiO2 without ion beam assistance. Laser damage characteristic is investi- gated. The results show that the laser induced damage threshold (LIDT) of the P polarization is 20 J/cm , and the relevant dam- age morphology indicates that the damage is initiated from nanosize absorbers located at the coating and substrate interface or and the damage is initiated from nodules or contamination patti
出处 《强激光与粒子束》 EI CAS CSCD 北大核心 2014年第5期130-135,共6页 High Power Laser and Particle Beams
基金 国家自然科学基金项目(61008030 61108014 61205124) 国家高技术发展计划项目
关键词 薄膜偏振器 入射角 电子束蒸发 激光损伤阈值 损伤形貌 Key words: thin film polarizer incidence angle electronic beam evaporation method laser induced damage threshold damage morphology
  • 相关文献

参考文献29

  • 1Besnard D. The megajoule laser program-ignition at hand[J]. The European Physical Journal D, 2007, 44(2):207-213.
  • 2范正修,范瑞瑛,陆月妹.1.06um宽带硬膜偏振片的研制[J].红外与毫米波学报,1982,1(2):121-130.
  • 3孔明东,李瑞洁.光学平板偏振分光镜对称膜系的优化设计[J].强激光与粒子束,2000,12(1):61-64. 被引量:8
  • 4Fournet C, Pinot B, Geenen B, et al. High damage threshold mirrors and rizers in the ZrOz/SiO2 and HfO2/SiO2 dielectric systems [C]//Procof SHE. 1992:282- 293.
  • 5Gu P F, Tang J F. Laser-induced damage resistance of thin-film polarizers prepared by ion assisted deposition[J]. Optics Letters, 1994, 19 (2) :81-83.
  • 6Stolz C J, Genin F Y, Reitter T A, et al. Effect of SiOz overcoat thickness on laser damage morphology of HfOz/SiO2 Brewsters angle po- larizers at 1064 nm[C]//Procof SPIE. 1997:266-272.
  • 7Genin F Y, Stolz C J, Reitter T A, et al. Effect of electric field distribution on the morphologies of laser induced damage in hafnia silica mul tilayer polarizers[C]//Proc of SHE. 1997:342-352.
  • 8Stolz C J. Brewster's angle thin film plate polarizer design study from an electric field perspective[C]//Proc of SHE. 1999, 3738:347- 353.
  • 9朱美萍,易葵,张伟丽,范正修,贺洪波,邵建达.Preparation of high performance thin-film polarizers[J].Chinese Optics Letters,2010,8(6):624-626. 被引量:1
  • 10Oliver J B. Evaporated HfOz/SiOz optical coatings and modifications for high-power laser applications[D]. Rochester: University of Roch ester, 2012.

二级参考文献49

  • 1赵元安,王涛,张东平,贺洪波,邵建达,范正修.脉冲激光辐照光学薄膜的缺陷损伤模型[J].光子学报,2005,34(9):1372-1375. 被引量:20
  • 2黄进,赵松楠,吕海兵,蒋晓东,袁晓东,郑万国.利用1064nm激光预处理提高pickoff镜损伤阈值[J].强激光与粒子束,2007,19(5):728-732. 被引量:9
  • 3J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, Proc. SPIE 5991, 599119 (2005).
  • 4P. F. Gu and J. F. Tang, Opt. Lett. 19, 81 (1994).
  • 5U. Schallenberg and N. Kaiser, Proc. SPIE 2966, 243 (2009).
  • 6X. Fu, K. Yi, J. Shao, and Z. Fan, Chin. Opt. Lett. 6, 544 (2008).
  • 7C. J. Stolz, Proc. SPIE 3738, 347 (1999).
  • 8H. A. Macleod, Thin Film Optical Filters (Institute of Physics Publishing, London, 1986).
  • 9D. M. A. Aminou and J. Squier, in OSA Proceedings on Advanced Solid-State Lasers 15, 212 (1993).
  • 10L. Xiao, D. Li, X. Li, Y. Zhao, and J. Shao, Chinese J. Lasers (in Chinese) 36, 1545 (2009).

共引文献27

同被引文献43

引证文献3

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部