摘要
采用三羟甲基丙烷(TMP)与邻苯二甲酸酐(PA)、顺丁烯二酸酐(MA)和丁二酸酐(SA)经酯化反应合成了新型亲水单体三羟甲基丙烷邻苯二甲酸单酯(TMPPs)、三羟甲基丙烷顺丁烯二酸单酯(TMPMs)和三羟甲基丙烷丁二酸单酯(TMPSs);并与聚氧乙烯醚(YmerTM N120)复合作为亲水扩链剂,通过预聚体法合成了聚氨酯水分散体(PUD)。研究了新型羧酸单体及TMPPs/N120质量比对PUD涂膜耐化学品性、硬度、力学性能、热稳定性的影响。研究发现,采用TMPPs制备PUD的贮存稳定性、涂膜硬度、耐水和耐醇性等优于TMPMs和TMPSs制备的PUD。随TMPPs/N120质量比增大,PUD固体含量降低,PUD胶膜的拉伸强度增大,断裂伸长率降低,涂膜硬度增大,耐醇性变好,适宜的TMPPs与N120质量比为6:5~4:8;与DMPA相比,TMPPs的引入提高了PUD涂膜的硬度和热稳定性,能显著提高PUD胶膜的耐污性(包括耐墨水性、耐咖啡、耐绿茶性、耐红酒性等)。因此,TMPPs是较好的制备PUD的亲水化合物。
The novel hydrophilic monomers trimethylolpropane phthalate esters (TMPPs), trimethylolpropane monoesters of maleic acid (TMPMs) and trimethylolpropane succinic monoester(TMPSs) were synthesized by esterification of trimethylolpropane(TMP) with phthalic anhydride(PA), maleic anhydride(MA) and succinic anhydride(SA), respectively. Then the anionic/non-ionic aqueous polyurethane dispersions (PUD) were synthesized by the prepolymer process using the novel hydrophilic monomers and polyoxyethylene ether (YmerTM N120) as compounding hydrophilic component. The effects of the type of hydrophilic monomers and mass ratio of TMPPs/N120 on the chemical resistance, hardness, mechanical properties and thermal stability of PUD films were studied. The storage stability, film hardness, water-and alcohol-resistance of PUD prepared from TMPPs were better than those from TMPMs and TMPSs. With increasing TMPPs/N120 mass ratio, the tensile strength of PUD film increased, elongation at break decreased, PUD film hardness increased and alcohol-resistance became good, while PUD solids contents decreased. The optimal mass ratio of TMPPs and N120 ranged from 6:5 to 4:8. Compared with DMPA, TMPPs could improve the hardness and thermal stability of PUD films, and significantly strengthened stain resistance, including resistance to ink, coffee, tea and wine. Therefore, TMPPs is a good hydrophilic compound to prepare PUD.
出处
《化工学报》
EI
CAS
CSCD
北大核心
2014年第6期2393-2399,共7页
CIESC Journal
基金
广东省省部产学研结合重大专项项目(2012A090300004)
关键词
酯化
聚合
乳液
聚氨酯
合成
耐化学品性
esterification
polymerization
emulsions
polyurethane
synthesize
chemical resistance