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氧化铟锡薄膜材料制备及其光电特性研究 被引量:1

A Study on the Preparation and Photoelectric Properties of Tin Doped Indium Oxide Thin Film
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摘要 采用溶胶-凝胶旋转涂膜法,以InCl3·4H2O和SnCl4·5H2O为前驱物在玻璃基片上制备了氧化铟锡(ITO)薄膜材料,研究掺锡浓度、涂膜层数、热处理温度和热处理时间等工艺条件对ITO薄膜光电特性的影响.实验结果表明,ITO薄膜的方块电阻和可见光透射率都与掺锡浓度、涂膜层数、热处理温度和时间等因素有关,最佳参数为锡掺杂量12wt%,热处理温度和时间分别为450℃和1h,薄膜层数为6层.最佳ITO薄膜的方块电阻为185Ω/□,可见光平均透射率为91.25%. The Sn doped In2 O 3 thin films were prepared on the glass substrates by sol-gel and rotating film method with InCl3 ·4H 2 O and SnCl4 ·5 H 2 O.The effects of blending tin concentration coating layer, heat-treatment temperature and time on the optical and electrical properties of ITO thin films were investigated.The experimental results show that the square resistance and the transmission rate of ITO thin film are related to the blending tin concentration,coating layer,heat-treatment temperature and time. And the best blending tin concentration is 12wt%,heat treatment temperature and time are 450 ℃ and 60 min,the coating layer is 6,respectively.The square resistance of ITO thin film is 185Ω/□and the transmission rate is 91.25%.
出处 《内蒙古师范大学学报(自然科学汉文版)》 CAS 北大核心 2014年第3期290-294,共5页 Journal of Inner Mongolia Normal University(Natural Science Edition)
基金 国家自然科学基金资助项目(51262022) 内蒙古师范大学研究生科研创新基金项目(CXJJS12034)
关键词 溶胶-凝胶法 ITO 薄膜 方块电阻 透射率 光电性能 sol-gel method ITO thin film square resistance transmission rate photoelectric property
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