摘要
采用分子束外延方法在 Si(111)衬底上生长了 Pb Se/ Ba F2 / Ca F2 薄膜 ,扫描电镜和 X-光衍射分析显示 ,通过生长 Ba F2 / Ca F2 缓冲层的方法 ,在 Si(111)衬底上外延的 Pb Se薄膜晶体质量高 ,Pb Se表面光亮 ,无开裂现象发生 ,X-光衍射峰峰宽窄 (15 3arcs) .外延生长的 Pb Se薄膜被应用于制作光电二极管 ,首次采用热蒸发金属铝膜在 Pb Se表面形成 Al- Pb Se肖特基结光电二极管 ,获得了比 Pb- Pb Se肖特基结更为稳定和理想的电流
PbSe films were grown on Si(111) by incorporation of BaF 2/CaF 2 buffers using molecular beam epitaxy. The measurements of both scanning electronic microscopy and high resolution X ray diffraction showed high crystalline quality of the PbSe films. The surface of PbSe was mirror like and no cracks were observed. The full width at half maximum of PbSe diffraction peak was only 153 arcsec. The epitaxial PbSe films were used to fabricate photodiodes. For the first time, metallic aluminum was used to form Al PbSe Schottky diodes, which demonstrated better and more stable current voltage characteristics than that obtained from Pb PbSe Schottky diodes.
出处
《红外与毫米波学报》
SCIE
EI
CAS
CSCD
北大核心
2001年第2期154-156,共3页
Journal of Infrared and Millimeter Waves
基金
浙江省自然科学基金! ( No.6960 2 7)资助项目&&
