摘要
本文介绍了四轴激光直接写入系统 ,对激光直接在光刻胶上写入图形的工艺进行了研究 ,讨论了在不同离焦情况下 ,胶层内光斑的大小和强度分布 ,采用离焦的方法在光刻胶上刻画了周期为 2 0μm的线光栅和线宽为 10 μm的分划板 。
In this paper a new laser direct writing system is introduced and fabrication techniques with laser direct writing are developed.The intensity distribution and size fo the writing spot within photoresist are discussed in different defocusing cases.The reticle with feature linewidth 10 μm and the grating with period 20 μm are fabricated by using the laser direct writing system under intentional defocusing.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2001年第9期949-952,共4页
Journal of Optoelectronics·Laser
基金
国家自然科学基金资助项目 ( 6 0 0 780 0 6 )
关键词
激光直接写入
离焦
光刻
laser direct writing system
defocusing
photolithography
