摘要
磁流变抛光是近十年来的一种新兴的先进光学制造技术 ,它利用磁流变抛光液在梯度磁场中发生流变而形成的具有粘塑行为的柔性“小磨头”进行抛光。被抛光光学元件的材料去除是在抛光区内实现的。首先简要阐述了磁流变抛光的抛光机理 ,然后利用标准磁流变抛光液进行抛光实验。研究了磁流变抛光中几种主要工艺参数对抛光区的大小和形状以及材料去除率的影响情况。最后给出了磁流变抛光材料去除的规律。
A new optical manufacturing technology called magnetorheological finishing(MRF) has developed over last decade. In MRF, the magnetic field stiffened magnetorheological polishing fluid (MPF)constitutes a small lap, which is used to polish optical element. Material removal of optical element is done in 'polishing spot'. Mechanism of MRF is described in this paper. In order to study the size and shape of 'polishing spot' and the material removal rate of optical element, several MRF experiments have been done by using 'standard' MPF. At last, the material removal rules of MRF have been given in the paper.
出处
《光学技术》
CAS
CSCD
2001年第6期522-523,525,共3页
Optical Technique
基金
国家自然科学基金资助项目 (6960 80 0 6)
