摘要
为了在硅基底上得到不同化学基团修饰的图形，在氢终止硅（ｌｌｌ）表面运用光刻技术和光化学反应结合来控制表面成膜反应的位置，并用ＡＦＭ、ＸＰＳ、接触角测定等验证了这种方法的可行性．
Hydrogen-terminated silicon surface was found to react with I-alkenes to produce stable monolayers. To pattern such monolayers and create surfaces with regions of different chemical functionalities, we used the combination of the photolithography and the light induced alkylation. The surfaces had been characterized by XPS, AFM, and contact angel measurement. It is shown that this procedure can be used to prepare micro-patterns of chemical functional groups on silicon substrate.
出处
《物理化学学报》
SCIE
CAS
CSCD
北大核心
2001年第10期931-935,共5页
Acta Physico-Chimica Sinica
基金
国家重点基础研究发展规划(G1999075305)
国家自然科学基金(29953001
29973003)资助项目
