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热丝法化学气相沉积金刚石系统温度分布与薄膜生长关系研究 被引量:3

Study of the Relationship between Temperature Field and Diamond Film Growth in Hot-filament CVD Reactors
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摘要 对热丝化学气相沉积金刚石薄膜系统内的三种传热方式 (传导、对流和辐射 )进行了比较分析 ,数值计算了气相空间温度分布和衬底表面二维温度分布。采用热丝化学气相沉积工艺制备了金刚石薄膜 。 Heat and mass transfer affect growth rate and properties of diamond films in hot filament chemical vapor deposition reactors Thermal transfer in three ways (conduction, convection and radiation) was analyzed and the temperature fields were also numerically calculated in this paper Conduction is the dominant mechanism in gas phase thermal transfer, while the temperature field on the substrate surface is determined mainly by radiation from the filament The growth rate and microstructure of the diamond film prepared by HFCVD method is related to the temperature field on the substrate surface Large area temperature field of high uniformity, which benefits to the growth of diamond film in large scale, can be obtained by using multi filaments
出处 《材料工程》 EI CAS CSCD 北大核心 2001年第11期31-34,16,共5页 Journal of Materials Engineering
基金 国家自然科学基金资助项目 ( 5 9976 0 38)
关键词 热丝化学气相沉积 温度场 薄膜生长 金刚石薄膜 温度分布 传热 hot filament CVD diamond temperature field film growth
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