摘要
介绍了电感耦合等离子体原子发射光谱法(ICP-OES)测定工业硅中铁的检测过程。阐述了测定过程不确定度的主要来源,对各不确定度分量进行了量化计算,得出合成标准不确定度、扩展不确定度及测定结果的置信区间。发现测量重复性和工作曲线变动性是引起不确定度的主要因素。
The determination process of iron in industrial silicon by inductively coupled plasma atomic emission spectrometry (ICP-OES)was introduced.The main sources of uncertainty in the determination process are described.The components of uncertainty are quantitatively calculated.The synthetic standard uncertainty,expanded uncertainty and confidence interval of the results are obtained.It is found that repeatability and variation of work curve are the main factors causing uncertainty.
作者
黄建新
魏新华
李建国
殷林涛
熊明方
Huang Jianxin;Wei Xinhua;Li Jianguo;Yin Lintao;Xiong Mingfang
出处
《计量与测试技术》
2019年第1期112-115,共4页
Metrology & Measurement Technique
