摘要
难熔金属材料以其熔点高、高温性能好和耐腐蚀性优异等特点被广泛应用于航空航天、化学化工和国防军工等领域。化学气相沉积法是目前获得高纯致密、尺寸精确的难熔金属制品的最佳手段。本文介绍了钨、钼、钽、铌和铼五种难熔金属元素的应用领域,综述了采用不同的化学气相沉积法制备难熔金属及其合金的工艺、制品性能和具体用途,总结了金属源先驱体类型对化学气相沉积工艺的影响,分析展望了化学气相沉积法在制备难熔金属上的应用前景。
Refractory metal materials are widely used in aerospace, chemical and defense industries due to their high melting point, high temperature performance and excellent corrosion resistance. Chemical vapor deposition is a logical method for high purity, dense and dimensionally accurate refractory metal products. In this paper, the application fields of five kinds of refractory metal elements such as tungsten, molybdenum, tantalum, niobium and rhenium are introduced. The process, products properties and specific purpose of the refractory metals and their alloy prepared by various chemical vapor deposition methods are reviewed. The influence of the type of the metal source precursor on the chemical vapor deposition is concluded. The prospect of the chemical vapor deposition in the preparation of the refractory metals is analyzed and forecasted.
作者
白书欣
牛顿
朱利安
叶益聪
Bai Shuxin;Niu Dun;Zhu Li'an;Ye Yicong(College of Aerospace Science and Engineering,National University of Defense Technology, Changsha Hunan 410073,China)
出处
《硬质合金》
CAS
2018年第6期381-389,共9页
Cemented Carbides
基金
国家自然科学基金青年基金项目(51501224)
国家自然科学基金面上项目(51371196)
关键词
难熔金属
化学气相沉积
钨
铼
refractory metal
chemical vapor deposition
tungsten
rhenium
