期刊文献+

热丝法批量制备金刚石涂层钻头参数仿真优化 被引量:2

Simulation Optimization of Deposition Parameters in HFCVD Diamond Films Growth on Large Quantities of Drills
下载PDF
导出
摘要 基于有限容积法,研究了采用热丝化学气相沉积法常规工艺在批量化YG6硬质合金钻头工作表面制备金刚石涂层过程中基体表面的温度场分布状况,并通过测温对照试验验证了仿真方法及仿真结果的合理性和正确性.在传统的等间距热丝排布方式基础上系统研究了不同热丝参数(间距D、长度L、半径r、温度T和高度H)对基体温度场分布的影响,并进一步提出了不等间距的热丝排布形式以提高批量化基体表面温度场分布的均匀性,据此确定了用于批量制备金刚石涂层钻头的最优沉积参数.采用最优参数批量制备的金刚石涂层钻头具有较好的涂层质量和一致性,进一步验证了基于仿真的沉积参数优化方法的可靠性. Based on the finite volume method (FVM), the substrate temperature distributions in HFCVD diamond films growth on large quantities of drills with the conventional deposition parameters were investigated. The corresponding temperature measurement tests were also conducted, verifying the rationality and correctness of the simulation method and results. Based on the traditional equidistant filament arrangement, the influences of different deposition parameters on substrate temperature distributions were systematically studied, including the filament.separation D, filament length L, filament radius r, filament temperature T and filament height H. Furthermore, a novel non-equidistant filament arrangement was proposed to further improve the uniformity of the substrate temperature distribution, and the optimized deposition parameters were finally determined. The diamond coated drills fabricated with such optimized parameters present satisfying uniformity coating quality, further testifying the reliability of the parameters optimization method based on the simulations.
出处 《上海交通大学学报》 EI CAS CSCD 北大核心 2014年第11期1600-1605,1612,共7页 Journal of Shanghai Jiaotong University
基金 国家自然科学基金资助项目(51275302 51005154)
关键词 热丝化学气相沉积 批量化 金刚石涂层钻头 温度场分布 参数优化 hot filament chemical vapor deposition(HFCVD) large quantities diamond coated drills temperature distribution parameter optimization
  • 相关文献

参考文献12

  • 1Haubner R, Kalss W. Diamond deposition on hard- metal substrates-Comparison of substrate pre-treat- ments and industrial applications [J]. International Journal of Refractory Metals and Hard Materials, 2010, 28(4): 475-483.
  • 2赵志岩,邓福铭,卢学军,徐国军.CVD金刚石涂层刀具研究与应用前景[J].硬质合金,2009,26(4):246-251. 被引量:21
  • 3Lee S, Choi S, Park K H, et al. Hot-filament CVD synthesis and application of carbon nanostructures [J]. Thin Solid Films, 2008, 516(5): 700-705.
  • 4. Amorim A, Nascente P A P, Trava-Airoldi V J, et al. Two-step growth of HFCVD diamond films over large areas[J]. Vacuum, 2011, 83(7): 1054-1056.
  • 5Wei QP, YuZ M, Ma L, etal. The effects of tem- perature on nanocrystalline diamond films deposited on WC-13 wt. % Co substrate with W-C gradient lay- er[J]. Applied Surface Science, 2009, 256(5): 1322- 1328.
  • 6Wolden C, Mitra S, Gleason K K. Radiative heat transfer in hot-filament chemical vapor deposition dia- mond reactors[J]. Journal of Applied Physics, 1992, 72(8) : 3750-3758.
  • 7Barbosa D C, Nova H F V, Baldan M R. Numerical simulation of HFCVD process used for diamond growth[J]. Brazilian Journal of Physics, 2006, 36 (2) : 313-316.
  • 8左伟,沈彬,孙方宏,陈明.热丝化学气相法合成金刚石的温度场仿真及试验[J].上海交通大学学报,2008,42(7):1073-1076. 被引量:5
  • 9杨春,卢文壮,左敦稳,徐锋,任卫涛.HFCVD系统中衬底温度场及气相空间场的数值分析[J].人工晶体学报,2009,38(2):434-439. 被引量:7
  • 10Zhang T, Zhang J G, Shen B, et al. Simulation of temperature and gas density field distribution in dia- mond films growth on silicon wafer by hot filament CVD[J]. Journal of Crystal Growth, 2012, 343 (1) : 55-61.

二级参考文献35

共引文献28

同被引文献5

引证文献2

二级引证文献9

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部