摘要
为研究织构化表面的粘着行为,采用电感耦合等离子体刻蚀技术在硅片表面进行柱状织构的构筑。使用扫描电子显微镜（SEM）和原子力显微镜（AFM）对织构化硅片表面的形貌进行观测,利用原子力显微镜进行粘着试验,并考察织构对表面粘着性能的影响规律。结果表明：经过织构化的硅片表面上形成了较为规整均一的柱状织构,在相同试验条件下与未织构面相比,织构面上的粘着力显著降低（下降了73%~77%）,表明表面织构的存在减小了接触面积;当相邻织构间的距离一定时,具有较小直径的织构表面更有利于粘着力的减小;表面织构同时降低了范德华力和毛细力的大小,使范德华力减小了88%~89%,毛细力减小了62%~68%;无论是在未织构面还是织构面上,毛细力对表面粘着力的贡献均处于重要地位。
To study the adhesive properties of textured surfaces, silicon surfaces with pillar textures were prepared using inductively coupled plasma （ICP） etching technology. The morphologies of textures were observed through SEM and AFM. Adhesion tests were performed by the atomic force microscopy to investigate the effect of texturing on the adhesive properties. Experimental results show that regular and uniform pillar textures are produced on the silicon surfaces. Compared with untextured surfaces under the same condition, the adhesive force on textured surfaces significantly decreased and the drop was about 73%- 77%, which illustrates the fact that the existence of textures reduces the contact area. When the interval between patterns is fixed, textures with smaller diameters are more beneficial to adhesion-reduction. Both the van der Waals force and capillary force are reduced by about 88 %-89 % and 62%-68%, respectively, after the introduction of textures. Additionally, the capillary force plays an important role in contributing to the adhesive force for either untextured surfaces or textured surfaces.
出处
《中国表面工程》
EI
CAS
CSCD
北大核心
2015年第1期83-89,共7页
China Surface Engineering
基金
国家自然科学基金(51275046)
清华大学摩擦学国家重点实验室基金(SKLTKF12A03)
关键词
硅片
表面织构
粘着
silicon wafer
surface texture
adhesion
