摘要
化学气相沉积(Chemial vapor deposition,CVD)是制备高纯高致密钨零件及涂层的重要工艺。通过介绍采用CVD方法制备的纯钨材料的工艺与技术特点,并从CVD-W材料特性、产品种类,相关应用方向等方面阐述了CVD技术在钨材料制造中的发展情况,介绍了CVD-W在国防军工、核能、医疗等行业领域的应用,总结了CVD-W制备技术和材料的国内外现状,并指出了未来国内CVD技术在钨及难熔金属应用领域发展的总体方向。
Chemical vapor deposition （CVD） is an important technology producing high purity and density tungsten parts and coatings. The advances of tungsten material production applying CVD were discussed from the aspects of material features and products classification of CVD-W. The applications of CVD-W to national defense, nuclear fusion and X-Ray target were listed. The progress status of CVD-W was discussed. And the development directions of CVD-W in future were put forward.
出处
《中国钨业》
CAS
北大核心
2015年第2期53-59,共7页
China Tungsten Industry
基金
第56批中国博士后科学基金面上项目二等资助(2014M561867)
关键词
钨
化学气相沉积
涂层
难熔金属
tungsten
Chemical vapor deposition
coating
refractory metals
