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多孔钛基掺硼金刚石电极结构对电催化降解阿司匹林性能的影响 被引量:6

Effect of Structure of Ti/Boron-doped Diamond Electrode on the Electrochemical Degradation Performance for Aspirin
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摘要 利用扫描电子显微镜(SEM)和X射线衍射仪(XRD)对多孔Ti/BDD电极及传统平板Ti/BDD(BDD=钛基掺硼金刚石)电极进行了研究,通过循环伏安法考察了电极的背景电流和电化学窗口.以阿司匹林为模型污染物,研究了BDD电极结构对阿司匹林电催化降解的影响.结果表明,多孔Ti/BDD电极的总带电量,内、外部带电量,孔隙率和比表面积均高于平板Ti/BDD电极;多孔Ti/BDD在对COD和阿司匹林的去除率和能量消耗等方面均优于平板Ti/BDD电极. The surface morphology and crystal structure of three-dimensional 3D-porous titanium / boron-doped diamond( porous Ti / BDD) and planar Ti / BDD electrodes were studied by scanning electron microscopy( SEM) and X-ray diffraction( XRD). The cyclic voltammetry measurements of porous Ti/BDD and planar Ti / BDD electrodes were also performed. Porous Ti / BDD and planar Ti / BDD electrodes were used as anodes in the degradation of Aspirin,respectively. The results indicate that porous Ti / BDD has larger total,outer,and inner charges,porosity,and actual surface area due to the porous structure. Compared to planar Ti / PDD,porous Ti / BDD electrode is better on removal rate of chemical oxygen demand( COD) and Aspirin and energy consumption.
出处 《高等学校化学学报》 SCIE EI CAS CSCD 北大核心 2015年第9期1765-1770,共6页 Chemical Journal of Chinese Universities
基金 国家自然科学基金(批准号:21273097) 吉林省重大科技攻关招标项目(批准号:20130204003GX) 电分析化学国家重点实验室开放课题(2013)资助~~
关键词 多孔钛基体 掺硼金刚石薄膜电极 阿司匹林 电催化降解 Porous titanium substrate Boron-doped diamond film electrode Aspirin Electrochemical degradation
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参考文献28

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