摘要
用浸渍-提拉法在高硅氧玻璃纤维网格布上制备了掺杂金属Nd的TiO2薄膜,通过甲基橙的光催化降解实验来评价了催化剂薄膜的光催化性能,并用XRD、SEM和UV-Vis漫反射等分析方法对其结构进行了表征。结果表明:未掺杂和Nd掺杂均能得到锐钛矿型TiO2薄膜;适量掺杂金属Nd能够细化TiO2薄膜晶粒,使TiO2薄膜的拉曼和紫外可见漫反射峰位红移,拓宽了TiO2薄膜的光响应范围;与纯TiO2薄膜相比,掺杂金属Nd能够明显增强TiO2薄膜的光催化活性,当金属Nd的掺杂量为3wt%时,薄膜对甲基橙的降解最好。
Nd-doped TiOz thin films on high silica glass fiber were prepared by dip-coating method and characterized by X-ray diffraction, SEM, UV-Vis-DRS and so on. The photocatalytic activity of thin films was evaluated by the photocata- lytic degradation of methyl orange. The results showed that,both pure TiO2 and Nd-doped TiO2 thin films were of anatase type;The doping of appropriate amount of Nd can make the grain of TiO2 thin films finer,thus obtaining a red shift of the peaks of the UV-Vis-DRS and Raman which leaded to the broadening the light response scope of thin films,Compared with the pure TiO2 thin films,The doping of Nd improved the photoctalytic activity obviously. The thin film showed the highest catalytic activity when the Nd content was about 3wt%.
出处
《化工新型材料》
CAS
CSCD
北大核心
2015年第9期153-155,162,共4页
New Chemical Materials
基金
陕西省自然科学基础研究计划项目(2014JM2035)
"十二五"国家科技支撑计划项目(2013BAJ01B02)
关键词
TIO2薄膜
金属Nd
光催化性
机理
TiO2 thin films, metal Nd, photocatalytic activity, mechanism
