摘要
采用Hummer法对鳞片石墨进行氧化得到氧化石墨,之后经过超声剥离制备氧化石墨烯,最后在水合肼的作用下还原制备石墨烯。采用红外光谱、紫外-可见光光谱、拉曼光谱和原子力显微镜对还原前后的氧化石墨烯进行表征。发现化学还原可以除去氧化石墨烯表面一部分含氧官能团,但同时也引入一些缺陷,还原之后石墨烯的sp^2域的平均尺寸减小。AFM照片分析发现含氧官能团去除之后会在原来的位置产生空洞,从而导致石墨烯缺陷增加。
Graphite oxide （GrO） was prepared from flaky graphite via Hummer＇s method. The graphene oxide （GO） suspension was subsequently obtained by ultrasonic exfoliation, and the graphene was prepared by chemical reduction with hydrazine hydrate. FT-IR, Raman, UV-vis and AFM were employed to characterize the GO before and after reduction. The results indicated that part of oxygen-containing functional groups could be removed in the chemical reduction process, but some defects introduced simultaneously. In addition, the average size of the in-plane sp2 domains decreased after reduction. Moreover, a lot of cavities produced in the lo- cation of oxygen-containing groups after they were removed, resulting in the increase of defects in graphene.
出处
《炭素技术》
CAS
北大核心
2016年第3期12-15,共4页
Carbon Techniques
关键词
氧化石墨烯
石墨烯
化学还原
缺陷
Graphene oxide
graphene
chemical reduction
defect
