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氯化钽在离子液体1-丁基-3-甲基咪唑六氟磷酸盐中电化学行为 被引量:2

Electrochemical Behavior of Tantalum Pentachloride in 1-Butyl-3-methylimidazolium Hexafluorophosphate Ionic Liquid
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摘要 采用循环伏安法,研究了0.25 mol/L Ta Cl5在离子液体1-丁基-3-甲基咪唑六氟磷酸盐([Bmim]PF6)中的电化学行为。实验结果表明,电沉积钽是受扩散控制、两步骤的不可逆电极反应过程,首先是Ta(Ⅴ)还原为Ta(Ⅲ),其次是Ta(Ⅲ)还原为金属钽和形成其它低价钽氯化物。Ta(Ⅴ)/Ta(Ⅲ)和Ta(Ⅲ)/Ta在离子液体[Bmim]PF6中的阴极传递系数分别为0.155和0.406。Ta(Ⅴ)在离子液体[Bmim]PF6中的扩散系数为1.629×10-9cm2/s。在100℃和-1.25 V条件下,采用恒电势法在铂片上电沉积钽,扫描电子显微镜照片和EDS分析表明,沉积物为钽和钽的低价氯化物。 The electrochemical behavior of 0. 25 mol/L tantalum pentachloride is investigated in 1-butyl-3- methylimidazolium hexafluorophosphate ([ Bmim] PF6 ) by cyclic voltammetry. The results show that the electrodeposition process of tantalum is a two-step irreversible electrode reaction by diffusion control. Tantalum(Ⅴ) is first reduced to tantalum(Ⅲ), and tantalum(Ⅲ) is further reduced to tantalum metal and tantalum subchloride. The cathodic transfer coefficients of Ta(Ⅴ)/Ta(Ⅲ) and Ta(Ⅲ)/Ta are 0. 155 and 0. 406, respectively. The diffusion coefficient of Ta ( V ) is 1. 629×10^-9cm^2/s. The electrodeposition of tantalum on platinum substrate from TaCl5-[Bmim] PF6 is performed using the potentiostatic method at 100℃ and - 1.25 V. SEM and EDS analysis results indicate that the electrodeposits are mixtures of tantalum metal and tantalum subchiloride.
出处 《应用化学》 CAS CSCD 北大核心 2016年第9期1093-1098,共6页 Chinese Journal of Applied Chemistry
基金 国家自然科学基金(51501073,51375209) 江苏省自然科学基金(BK20140162) 中央高校基本科研业务费专项资金(JUSRP11455,JUSRP51511)资助项目~~
关键词 氯化钽 离子液体 电化学 电沉积 tantalum pentachloride ionic liquid electrochemistry electrodeposition
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