摘要
钒合金表面获得性能优良的Al涂层是在其表面制备V-Al/Al2O_3阻氚涂层的重要基础。针对聚变堆候选结构材料V-5Cr-5Ti,本文采用电化学方法研究了其在AlCl_3-EMIC(摩尔比为2∶1)离子液体中的阳极行为,比较分析了恒电位极化模式下不同电位、极化时间对表面阳极活化的影响。在此基础上,采用恒电流沉积(16mA/cm^2)模式研究了阳极活化电位、沉积时间和温度对镀层的影响。结果表明:阳极氧化电流在1.25V(参比Al的电位)电位时出现峰值,在该电位下极化15min,V-5Cr-5Ti基体可获得腐蚀均匀的可再生表面。16mA/cm^2下铝沉积,活化表面为(111)和(200)方向择优生长的纯铝涂层,与基体结合良好,室温下沉积75min,可获得20μm厚性能良好的铝涂层。
The Al coating with fine performance on V-alloy surface is an important foundation for the fabrication of V-Al/Al2O_3 as tritium permeation barrier.In present work,the anodic behavior of V-5Cr-5Ti（a candidate structural material of fusion reactor）in AlCl_3-EMIC（with molar ratio of 2∶1）ionic liquid was studied by electrochemical analysis.The influences of different potentials and time on anodic etching of V-5Cr-5Ti were investigated by potentiostatically anodic polarization.And on this basis,the effects ofanodic potential,deposition time and temperature on Al coatings were studied under constant current density（16mA/cm^2）.The results show that the anodic oxidation current reaches maximum when anodic potential is 1.25 V,and the uniform and reproducible surface of V-5Cr-5Ti is obtained by etching with this potential for 15 min.With the current density of 16 mA/cm^2,the coatings are pure Al with preferred orientation of（111）and（200）,and well adhesion.A compact and integral Al coating with thickness of 20μm can be obtained after 75 min at 16mA/cm^2 under room temperature.
出处
《原子能科学技术》
EI
CAS
CSCD
北大核心
2016年第10期1902-1908,共7页
Atomic Energy Science and Technology
基金
国家磁约束聚变能发展研究专项资助项目(2013GB110000B)
中国工程物理研究院聚变能源科学技术研究中心资助项目(ZK201402-0304)
