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适用于SiC化学气相沉积工艺的真空机组研究

Study on proper vacuum pump set used for SiC chemical vapor deposition process
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摘要 通过实验对不同真空泵应用于SiC化学气相沉积工艺的失效时间进行对比,并从结构上对不同真空泵失效的原理进行分析,确定了适用于SIC化学气相沉积工艺的真空泵组。 Through comparison of the experiment failure time on different vacuum pumps used in SiC chemical vapor deposition process as well as structural analysis of the principle of vacuum pump failure, determination is made for the proper vacuum pump set used in SiC chemical vapor deposition process.
作者 周岳兵 胡祥龙 胡高健 李益民 ZHOUYue-bing HU Xiang-long HU Gao-jian LI Yi-min(Powder Metallurgy Research Institute, Central South University, Changsha 410083, China ACME, Changsha410118, China)
出处 《炭素》 2016年第4期28-29,10,共3页 Carbon
关键词 SIC 化学气相沉积 真空泵 SiC chemical vapor deposition vacuum valve
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