摘要
选用2,2′-双三氟甲基-4,4′-联苯二胺(TFDB)与二苯醚四甲酸二酐(ODPA)作为聚合物的基本骨架进行缩聚反应生成聚酰胺酸,再经过化学亚胺化得到可溶性聚酰亚胺(PI)。通过调节2-甲基吡啶在亚胺化试剂中的含量以达到控制酰亚胺化程度的目的,探讨不同亚胺化程度的PI胶的显影性能。结果表明,当n(2-甲基吡啶)∶n(乙酸酐)=1∶5时,所合成的光敏聚酰亚胺的显影性能最优。
Condensation polymerization of 2,2'-bis ( trifluoromethyl ) -4,4'-diamino biphenyl ( TFDB ) and 3,3',4,4'-tetracarboxydiphthalie ether dianhydride (ODPA) gives a soluble polyimide. The effect of the degree of chemical imidization on positive photosensitive poiyimide performance was investigated by adjusting the content of ct-picoline in the imidization reagent to control the extent of the imide. The results show that the photosensitive polyimide has the best developing performance when the mole ratio of α-picoline to acetic anhydride is 1 to 5 in the process of chemical imidization.
出处
《应用化学》
CAS
CSCD
北大核心
2017年第3期276-281,共6页
Chinese Journal of Applied Chemistry
基金
国家电网公司科技项目:高压IGBT芯片表面钝化工艺研究(5455DW150005)~~
关键词
正性光敏聚酰亚胺
化学亚胺化
溶解性
光刻
positive photosensitive polyimide
chemical imidization
solubility
photolithography