摘要
X射线衍射仪是材料研究中物相表征的常规手段,利用X射线衍射测试纳米级平整薄膜厚度具有无损、高精度、测试范围大的优点。以ITO薄膜材料为例,利用布鲁克D8 advance衍射仪通过X射线反射法测量薄膜材料的厚度以及粗糙度等结构参数,对测试样品的要求、测量方法的原理、布鲁克D8 advance衍射仪的具体调试和测试步骤以及数据处理方法等进行了详细的说明。这一方法为高校利用常见的X射线衍射仪测试薄膜材料结构参数提供了具体的实验指导。
X ray diffractometer is widely used in crystal structure characterization of different materials.But the usage of it in thickness measurement of nanoscale thin film is not so familiar to people. The Xray reflection method is nondestructive and it possess high degree of accuracy. Take ITO thin film as example,the measurement of thickness and coarseness of nanoscale thin film through X ray reflection with X ray diffractometer is illustrated. The requirement of sample,the theoretical principle of XRR,the specific debugging and measurement procedure of D8 advance diffractometer,and the analysis of measurement results are elaborated,which provided a specific experimental instruction for the measurement of thin film structure parameters with common X ray diffractometer in university and research Institute.
出处
《实验室科学》
2017年第1期29-32,共4页
Laboratory Science
基金
天津大学实验教学改革项目"材料学院大型仪器平台实验室建设与创新性人才培养"(项目编号:LAB2014-10)