摘要
针对目前大多数标准漏孔的漏率都是在He和入口压力为100 kPa下的漏率,采用定容变压法校准了铭牌漏率为2.3×10^(-6)Pa·m^3/s的标准真空漏孔在使用H_2、He、D_2三种气体时,在不同入口压力下的漏率。预先对系统进行了加热除气后计算了系统本底漏率大小,并探讨了本底漏率对校准漏孔漏率的影响。结合粘滞流-分子流理论研究了不同气体和漏孔入口压力对漏孔漏率的影响。
The influence of the new leak-rate calibration conditions of the reference leaks, including the background leak （outgassing） -rate, inlet-pressure （p） and gases＇ viscosity （ He, H2 and D2 ）, on theleak-ratewas theoretically analyzed in viscous molecular flow theory and experimentally investigated in constant volume method with a reference leak at a leak-rate of 2.3×10^-6Pa·m^3/s. The results show that the leak-rate depends significantly on the gas type and inlet-pressure, but weakly on the background ＂leak-rate＂. To be specific, for a reference leak at 2. 3×10^-6Pa·m^3/s in 100 -400 kPa range,the leak-rate of H2, He and D2 （in viscosity molecular flow） is linearly proportional to p2 ; but at a fixed inlet-pressure, the leak-rate is inversely proportional to the gas＇ s viscosity ; He （H2 ） has the largest （smallest） leak-rate among the gases because of the highest （lowest） viscosity; and calibrted at a leak-rate below 10^-7Pa·m^3/s,the usually negligible background leak-rate of 1.15×10^-8Pa·m^3/s makes the difference.
出处
《真空科学与技术学报》
CSCD
北大核心
2017年第4期345-350,共6页
Chinese Journal of Vacuum Science and Technology
关键词
真空漏孔
漏率
校准
粘滞-分子流
Vacuum leak, Leak rate, Calibration, Viscous-molecular flow
