摘要
杨氏双缝干涉实验中,在理想单色扩展光源照射下,干涉条纹的可见度不仅仅和光源宽度有关.本文理论模拟了理想单色扩展光源照射情况下光源宽度、狭缝间距离等多项因素对于涉图样可见度的影响,模拟结果有助于学生对单色扩展光源干涉图样清晰程度的理解和掌握.
Under the light irradiation of the ideal monochromatic extension, visibility of interference fringes is not just related to light source width in Young's double - slit interference experiment. In this paper, we theoretically simulated the influence of many factors to visibility of interference fringes such as the distance between two slits and the light source width. The simulation result is helpful for students to understand and master interference pattern in Young^s Double- slit interference experiment with extended monochromatic light source.
出处
《物理通报》
2017年第7期12-14,共3页
Physics Bulletin
关键词
可见度
光源宽度
理论模拟
visibility
width of the light source
theoretical simulation