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PS-VA模式中RM残留量对信赖性的影响(英文) 被引量:1

Impact on image sticking of residual reactive mesogen in PS-VA mode
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摘要 PSVA技术已经广泛应用于电视技术,但是残像问题仍然没有解决,为了改善PS-VA电视屏的IS表现,本文通过UV1和UV2制程影响RM来研究RM的残留量与IS表现的关系,结果表明RM残留量和IS有很强的相关性。众所周知,离子浓度是IS问题的关键因素,基于分析RM残留量和离子浓度的关系,我们开了一种改善PS-VA模式IS问题的新技术,另外,本文提出通过设计新的母体混晶材料,使PS-VA制程后液晶具有更低RM残留量来改善IS问题,同时通过大量的测试数据验证改善效果,其中离子浓度由Toyo6254测试,通过SEM和AFM来分析表面形态。 Well known PS-VA technology has been extensively used for TV application, but the image sticking issue is still a concern. In order to improve the image sticking performance of PS-VA TV pan- el, the condition of both UV1 and UV2 process are investigated to find out the relationship between the residual amount of RM and the image sticking performance. It shows that the image sticking per- formance is related to the RM residual amount. As we know, ion density is a factor of image sticking issue. Based on analysis on the relationship between ion density and RM residual amount, we develop a new technology to reduce the image sticking issue in PS-VA mode. Furthermore, another method is provided in this work to improve the image sticking performance by designing a new LC host mixture which has lower residual amount of RM. The technical data is obtained including ion density data measured by Toyo 6254 and surface profile investigation by SEM and AFM.
作者 贵丽红 池宝林 赵国 高红茹 温刚 李正强 舒克伦 梁瑞祥 GUI Li-hong CHI Bao-lin ZHAO Guo GAO Hong-ru WEN Gang LI Zheng-qiang SHU Ke-lun LIANG Rui-xiang(Hebei Engineering ~ Technology Center for FPD Materials,Shijiazhuang Chengzhi Yonghua Display Material Co., L TD ,Shijiazhuang 050091, China Shenzhen China Star Optoelectronics Technology Co., LTD,Shenzhen 518132, China)
出处 《液晶与显示》 CAS CSCD 北大核心 2017年第10期799-803,共5页 Chinese Journal of Liquid Crystals and Displays
关键词 PS-VA 残像 RM残留量 离子浓度 液晶 PS-VA image sticking RM residual amount ion density l liquid crystal
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