摘要
介绍了纳米几何量量值传递中纳米标准样版的计量与溯源特性。分析了微纳米测量仪器在纳米标准样版几何参量校准中对标准样版循迹结构的具体需求。设计了标准值为60 nm,具有可循迹结构的纳米台阶标准样版。为了实现高精度、溯源性表征,基于计量型纳米测量仪(NMM),结合多种定位测量方法,对加工的纳米台阶标准样版进行测量与评价,并对其开展区域均匀性和长时间稳定性实验。实验结果表明,制备的台阶标准样版高度值与设计值基本一致,设计的循迹结构能有效地协助电荷耦合器件(CCD)实现快速循迹与定位,且采用溅射镀膜工艺优化了标准样版表面结构的特性,使多种定位测量方法的测量重复性标准偏差均小于1 nm。
The metrological and traceability characteristics of nano standard templates in nano geometric value transfer were introduced. In the geometric parameter calibration of nano standard templates, the specific requirements of the micro and nano measurement instrument on the standard template tracking structure were analyzed. A nano step standard template with a standard value of 60 nm and tracking structures was designed. In order to achieve high precision and traceability characterization, based on the metrological nano measuring machine （NMM）, combined with a variety of positioning and measuring methods, the processed nano step standard template were measured and evaluated, and the regional uniformity and long-term stability experiments were carried out. The experimental results show that the height value of the prepared nano step standard template is basically the same as the design value. The designed tracking structure can effectively assist the charge-coupled device （CCD） to achieve rapid tracking and positioning. And the surface structure characteristics of the standard template were optimized by the sputtering coating process, the measuring repeatability standard deviation of the various positioning and measuring methods are less than 1 nm.
出处
《微纳电子技术》
北大核心
2017年第12期840-846,共7页
Micronanoelectronic Technology
基金
国家重大仪器专项资助项目(2014YQ090709)
关键词
量值传递
刻蚀工艺
标准样版
纳米测量仪(NMM)
溅射镀膜工艺
value transfer
etching process
standard template
nano measuring machine （NMM）
sputtering coating process
