摘要
采用分子动力学的方法,对He气在纳米通道内的流动过程进行了模拟研究。研究发现,流体处在层流和紊流的流动状态时,原子在流动过程中速度和原子数密度沿流动方向近似呈线性变化。流体处在层流流动状态时,在壁面附近会产生一定厚度的吸附层。模拟结果与相关研究结果吻合。
A physical model was established,and then the flow process of He gas in the nanometer channel was investigated by molecular dynamics simulations. The results showed that when the fluid was in the laminar or turbulent flow,the velocity and density of the atoms number in the flow process linearly changed in the flow direction. When the fluid was in the laminar flow state,a certain thickness of the adsorption layer would be produced near the wall surface.The simulation results agreed with experimental results very well.
作者
韩强
祁影霞
HAN Qiang;QI Ying-xia(School of Energy and Power Engineering, University of Shanghai for Science ＆ Technology, Shanghai 200093, Chin)
出处
《能源工程》
2017年第6期14-19,共6页
Energy Engineering
关键词
纳米通道
分子动力学模拟
流体
层流
紊流
nanochannel
molecular dynamics simulation
fluid
laminar flow
turbulent flow
