摘要
采用四种不同微观组织的钛靶,在同一沉积条件下在高速钢基底上磁控溅射得到氮化钛薄膜。研究了该四种氮化钛薄膜的表面形貌、表面粗糙度、表面颗粒、断口形貌、薄膜厚度、纳米硬度和相结构等。结果表明:随着等轴晶钛靶的晶粒尺寸的增大,氮化钛薄膜的表面粗糙度减小,表面颗粒尺寸、薄膜中氮含量、柱状晶尺寸、薄膜厚度、硬度均先变小后变大。魏氏组织钛靶沉积得到的氮化钛薄膜具有表面光滑、表面颗粒细小、柱状晶细小、硬度居中等特点。薄膜的硬度主要与薄膜中Ti N(111)的择优取向程度有关,择优取向度越高,硬度越高。
TiN films which were deposited on high speed steel substrate by magnetron sputtering adopting four kinds of different microstructure of titanium targets under the same deposition process were obtained. The surface morphology, surface roughness, surface particle, fracture morphology, film thickness, nano-hardness and phase structure of the films were analyzed. The results show that with the increase of the grain size of titanium target with isometric crystal, the surface roughness of TiN films decreae, and the size of surface particle,the nitrogen content, columnar crystals size, the films thickness and the hardness all decreaes firstly and then increase. The TiN films deposited by widmanstatten structure titanium target have the characteristic of smooth surface, smaller particle on the surface, smaller columnar crystals and moderate hardness. The film hardness is mainly related to the degree of preferred orientation of TiN （1 l 1）, the higher the preferred orientation degree, the higher the hardness.
出处
《热加工工艺》
CSCD
北大核心
2017年第24期181-184,189,共5页
Hot Working Technology
