摘要
为制备高化学计量比的SnS薄膜,使用一种简单的旋涂热解法,在空气中以载玻片和FTO为衬底,在热解温度分别为280℃、320℃和360℃条件下制备了系列SnS薄膜,并采用EDS、XRD、Raman、SEM、UV-Vis-NIR等手段研究了热解温度对SnS薄膜元素组成、晶相、形貌、光学吸收等的影响。结果表明,在热解温度为320℃热解10min时,获得的SnS薄膜Sn/S的原子比为1/0.99,直接禁带宽度为1.46eV,十分接近太阳能电池吸收层的最佳禁带宽度1.50eV,在太阳能电池吸收层材料领域具有重要潜在应用价值。
To prepare high stoichiometric-ratio Sn S thin films,a serials Sn S thin films were prepared at 280 ℃,320 ℃ and 360 ℃ on slide glass and FTO substrates in air by a facial spin coating-pyrolysis method. Energy spectrum analysis( EDS),X-ray diffraction( XRD),Raman scattering analysis,scanning electron microscopy( SEM)and ultraviolet-visible-near infrared spectrophotometer( UV-VIS-NIR) were used to investigate the elementary compositions,crystalline phases,morphologies and optical absorption. The Sn S thin film with the high Sn/S stoichiometric-ratio of 1/0. 99 and a direct corresponding ban gap of 1. 46 e V was prepared at 320 ℃ for 10 min,which was very close to the optimal band gap required by the absorption layer in semiconductor solar cell( 1. 5 e V) and with important potential application value in this field.
出处
《科学技术与工程》
北大核心
2018年第4期71-75,共5页
Science Technology and Engineering
基金
国家自然科学基金(21565001)
国家民委化工重点实验室科研项目(2017HG07)
北方民族大学科研项目(2016 HG-KY 05)资助
关键词
SnS薄膜
旋涂热解
化学计量比
拉曼光谱
光学吸收
SnS thin film
spin coating-pyrolysis
stoichiometric ratio
Raman spectrum
optical absorption
