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原位聚合法制备石墨烯/PPSU介电复合薄膜 被引量:2

Preparation of Graphene/Polyethylene Sulfone Dielectric Composite Films by In-situ Polymerization
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摘要 采用二氯亚砜对氧化石墨烯进行表面化学修饰得到酰氯化石墨烯,然后通过原位聚合法与酚羟基封端的聚苯砜反应制备了一系列不同石墨烯含量的石墨烯/聚苯砜纳米复合薄膜。研究石墨烯对该复合薄膜的微观形貌、力学性能、介电性能的影响。结果表明:酰氯化石墨烯可使得石墨烯与聚苯砜基体之间共价结合,提高石墨烯在基体树脂中的分散稳定性和界面相容性,进而有效地改善聚苯砜的力学性能和介电性能。石墨烯/聚苯砜纳米复合薄膜的介电常数和介质损耗因数随着石墨烯含量的增加呈先慢后快的增长趋势;石墨烯质量分数为3%的复合薄膜的介电常数高达18,是纯聚苯砜薄膜的介电常数的4.5倍;同时复合薄膜还具有较低的介质损耗因数和良好的介电-频率稳定性。 A chlorinated graphene(GN) was obtained using thionyl chloride to modify graphene oxide. A series of GN/PPSU nanocomposite films with different GN content were prepared from the chlorinated GN and phenolic hydroxyl group end-capped polyethylene sulfone(PPSU) by in-situ polymerization method, and the effect of the chlorinated GN on their micro-structure, mechanical properties, and dielectric properties were studied. The results show that the covalent binding between the chlorinated GN and PPSU matrix increases the dispersion stability and interfacial compatibility of GN in the matrix resin,which would improve the mechanical and dielectric properties of PPSU efficiently. With the increase of GN content, the dielectric constant and dielectric loss factor of the composite films increase slowly at first and then become fast. When the mass fraction of GN is 3%, the dielectric constant of the composite film is 18, which is 4.5 times larger than that of PPSU. Besides, the composite films present quite low dielectric loss factor and good permittivity-frequency stability.
作者 田雨涵 胡林清 郑晓翼 何刚 钟家春 蒲泽军 TIAN Yuhan;HU Linqing;ZHENG Xaioyi;HE Gang;ZHONG Jiachun;PU Zejun(College of Materials Science and Engineering,Sichuan University of Science & Engineering,Zigong 643000,Chin)
出处 《绝缘材料》 CAS 北大核心 2018年第7期22-26,共5页 Insulating Materials
基金 自贡市重点科技计划项目(2016XC03) 四川理工学院人才引进项目(2015RCL56)
关键词 石墨烯 原位聚合 聚苯砜 界面相容性 介电性能 graphene in-situ polymerization polyethylene sulfone interracial compatibility dielectric properties
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