摘要
目前鲜见钛合金基体上TiAlN膜层退除工艺的研究报道。利用电弧离子镀技术并使用Ti-Al(原子比1∶1)合金靶在钛合金TC4基体上镀覆TiAlN膜层。使用亚硝酸盐、氢氧化钠配制退膜液,采用正交试验优选了退膜液各成分的浓度和退膜温度,确定了退膜液各成分的浓度及最佳退膜工艺,并比较了钛合金TC4基体及退膜后基体的表面形貌、成分、粗糙度、尺寸和结合力的变化。结果表明:以优选工艺退膜后基体表面光亮如初,形貌、成分、粗糙度变化不大,表面会产生1μm左右的轻微腐蚀,结合力略有提高。该退膜液成分简单、易于控制,适用于批量生产。
Titanium aluminum nit_ride （TiAIN） film was formed on TC4 alloy substrate by e｜ectric arc ion plating and Ti-AI （ atomic percentage 50 ： 50） alloy target. Nitrite and sodium hydroxide were used to prepare solution for stripping the film, and orthogonal experiments were em- ployed to optimize the factors such as the concentration of each component and stripping temperature, and further to confirm the proper combination of the components and the optimal effective process. In addition, the surface morphology, composition, roughness, size and binding force of titanium alloy TC4 substrate before and after film removal treatment were compared and studied, respectively. Results showed that the stripped surface was as bright as new, and the morphology, composition and roughness changed little. A slight corrosion phenomenon with a depth of about 1 μm was observed and the combination strength was slightly improved. Besides, the stripping solution with simple composition and easy to control properties was suitable tor batch production.
作者
付新广
王战东
王彦峰
王毅飞
FU Xin-guang;WANG Zhan-dong;WANG Yan-feng;WANG Yi-fei(Avic Shaanxi Baocheng Aviation Instrument Co.,Ltd.,Baoji 721006,China;Northwest Institute for Non- Ferrous Metal Research,Xi＇ an 710016,China)
出处
《材料保护》
CAS
CSCD
北大核心
2018年第7期72-75,共4页
Materials Protection
关键词
退膜液
TiAlN膜
钛合金
stripping solution
titanium aluminum nitride coating
titanium alloy
