摘要
高功率脉冲磁控溅射因其高离化率得到广泛关注,是磁控溅射领域的新方向。随着对高功率脉冲磁控溅射放电和等离子特性的深入研究,制约高功率脉冲磁控溅射应用的主要不足有:沉积速率低,容易进入电弧放电影响膜层品质。本文从电源角度出发,针对高功率脉冲磁控溅射的高功率大电流特点,采用复合直流/脉冲电源提升高功率脉冲磁控溅射的沉积速率,采用电弧抑制电路避免电弧对膜层品质的危害。结果表明,复合高功率脉冲磁控溅射电源的设计有利于改善沉积速率;电弧抑制电路可快速检测,并通过电弧抑制回路快速释放残存能量,避免了电弧对高功率脉冲磁控溅射的影响。
High power impulse magnetron sputtering（HiPIMS） has been investigated widely due to its high ionization rate. The HiPIMS is a new trend in the field of magnetron sputtering. With the research on high power pulsed magnetron sputtering discharge and plasma characteristics, low deposition rate and arc discharge, affecting the quality of the film, are the shortcomings that restrict the industrial application of HiPIMS. Aiming at the high power and large current of HiPIMS, this paper uses the hybrid DC/Pulse power supply to improve the deposition rate and the arc suppression circuit to avoid the influence of the film quality. The results show that the hybrid high power impulse magnetron sputtering power supply helps to improve the deposition rate, and the arc suppression circuit can quickly detect and release the residual energy through the arc dedicated circuit, which greatly avoids the influence of arc on the HiPIMS.
作者
贺岩斌
熊涛
姜亚南
李民久
HE Yan-bin;XIONG Tao;JIANG Ya-nan;LI Min-jiu(Southwestern Institute of Physics,Chengdu 610041,China)
出处
《真空》
CAS
2018年第4期47-50,共4页
Vacuum
关键词
高功率脉冲磁控溅射电源
复合电源
沉积速率
电弧抑制电路
high power impulse magnetron sputtering power supply
hybrid power supply
deposition rate
arcsuppression circuit
