期刊文献+

基于0.13μm SOI CMOS工艺的高性能LDO设计 被引量:2

Design of high-performance LDO based on 0.13μm SOI CMOS process
下载PDF
导出
摘要 基于电子设备对电源管理芯片的需求,本文设计了一种输出电压2.8 V,最大负载电流为50mA的高性能低压差线性稳压器(low-dropout regulator,LDO)。该LDO采用调整管栅极驱动技术,改善了负载瞬态响应,同时利用片外电容的等效串联电阻(Equivalent Series Resistance,ESR)补偿系统频率,保证了LDO的稳定性。在国产0.13μm Silicon-On-Insulation CMOS工艺上,实现了电路原理图和版图的设计,芯片面积(不包含PAD)为0.009 mm2。该LDO电路使用Cadence、Spectre等工具进行了仿真验证,仿真结果表明:输出电压为2.8 V,输出过冲小于8 mV,最大负载响应时间为2.1μs,相位裕度大于77°,低频时电源电压抑制比PSRR为-90 dB,负载调整率为53μV/mA,线性调整率为3.37 mV/V。 Based on the requirement of electronic devices to power management chip, this paper presents a high performance low dropout linear regulator (LDO) with an output voltage of 2.8 V and a maximum source current of 50 mA. The LDO employs a tunable gate driving technology to improve its load transient response capability. Besides, the LDO adopts an ESR parasitic resistance generated by an off-chip capacitance to compensate its system frequency. Hence LDO can work stably. The schematic and layout of the LDO has been designed in a domestic 0.13μm silicon-on-insulator (SOl) CMOS process. The area without PADs is 0.009 mm^2. The simulations from Spectre tool show that the LDO has features of an output voltage of 2.8V, a response time of 2.1 μs with a maximum overshoot voltage of 8mV, a phase margin of larger than 77°, a power supply rejection ratio (PSRR) of-90dB at low frequency, a load regulation of 53 μV/mA and a linear regulation of 3.37 mV/V.
作者 李雅淑 高超嵩 孙向明 杨苹 LI Ya-shu;GAO Chao-song;SUN Xiang-ming;YANC Ping(Silicon-Pixel Laboratory at Central China Normal University,Wuhan 430079,China)
出处 《电子设计工程》 2018年第19期165-170,共6页 Electronic Design Engineering
基金 国家自然科学基金面上项目(11375073) 国家自然青年科学基金(11605071)
关键词 低压差线性稳压器 SOI工艺 高稳定性 瞬态响应 电源抑制比 low dropout linear regulator Silicon-On-Insulator (SOI) high stability transient response PSRR
  • 相关文献

参考文献9

二级参考文献52

共引文献38

同被引文献3

引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部