摘要
采用原子层沉积技术和多孔聚氨酯牺牲模板制备了氧化锌(ZnO)和铝掺杂氧化锌(AZO)纳米薄膜并研究了其光催化性能。首先利用原子层沉积技术,将ZnO和AZO沉积到多孔聚氨酯模板上,然后在500℃高温煅烧处理去掉牺牲模板,得到复制了多孔模板的氧化物纳米薄膜三维多孔结构。将该三维多孔结构压碎,得到片状纳米薄膜。实验结果表明,随着铝掺杂含量的提高,材料的带隙和光催化性能也相应提升。
Zinc oxide（ZnO）and aluminum-doped ZnO（AZO）thin films were fabricated by atomic layer deposition using porous polyurethane as a sacrificial template.ZnO and AZO were firstly deposited onto the surface of polyurethane porous template followed by a calcination at 500℃ in oxygen atmosphere.Three-dimensionally semiconductor porous structures as a replica of the sacrificial porous template were thus achieved.After pulverizing,the porous structures were broken into small pieces,which were then employed as photocatalysts.With increasing Al doping,the optical band gaps and the photocatalytic performance increase correspondingly.
作者
EDY Riyanto
黄高山
赵宇婷
张菁
石建军
梅永丰
EDY Riyanto;HUANG Gaoshan;ZHAO Yuting;ZHANG Jing;SHI Jianjun;MEI Yongfeng(State Key Laboratory for Modification of Chemical Fibers and Polymer Materials,College of Materials Science and Engineering,Donghua University,Shanghai 201620,China;Department of Materials Science,Fudan University,Shanghai 200433,China;College of Science,Donghna University,Shanghai 201620,China)
出处
《材料科学与工程学报》
CAS
CSCD
北大核心
2018年第5期705-712,719,共9页
Journal of Materials Science and Engineering
基金
National Natural Science Foundation of China(51322201,51475093)
Science and Technology Commission of Shanghai Municipality(14JC1400200)
关键词
原子层沉积
铝掺杂氧化锌
光催化
atomic layer deposition
Al-doped ZnO
photocatalysis
