摘要
本文报道了采用RF磁控溅射制备出了高性能的Fe-N薄膜 ,膜厚约 2 0 0nm ,磁场热处理后薄膜中含有α′和少量γ′ ,具有优质的软磁性能 ,饱和磁化强度 2 4T ,高于纯铁的 ,矫顽力小于 80A/m ,2～ 10MHz下的磁导率为15 0 0。然后提出一个模型 ,合理的解释了磁场热处理后薄膜表面的各向异性现象 ,包括不同方向的磁滞回线 ,剩磁比 。
nm Fe-N thin films prepared on glass substrates by RF magnetron sputtering were vacuum tempered at 250℃ under 1200A/m magnetic field.After heat treatment,Fe-N films consisted of mixed phases α′ and a little γ′,and had excellent soft magnetic properties,4πM S=2.4T exceeding that of pure iron,H c<80A/m,μ r=1500 under 2～10MHz.And a new model put forward geared to the anisotropy of the films after magnetic heat treatment,including the difference hysteresis hoop,remanence and coercivity at different direction.
出处
《金属功能材料》
CAS
2002年第5期18-23,共6页
Metallic Functional Materials
基金
国家自然科学基金资助项目 (项目号:19890 310
19392 30 0 )
