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ICP-MS法测定纯铑中16个杂质元素 被引量:8

Determination of 16 Impurities in Pure Rhodium by ICP-MS
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摘要 采用盐酸-过氧化氢微波消解铑粉样品,动态反应池(DRC)技术消除复合离子对Fe、Si的干扰,以内标校正法克服基体效应,建立了电感耦合等离子体质谱法(ICP-MS)测定纯铑中Mg、Al、Si、Mn、Fe、Ni、Cu、Zn、Ru、Ag、Pd、Sn、Ir、Pt、Au和Pb共16个杂质元素含量的方法。以Y、Re、Sc和In为内标元素,测定加标回收率为88.5%~116.2%,精密度(RSD)为0.63%~13.44%;方法测定下限低,除Fe(0.0001%)和Si(0.0005%)外,其余元素测定下限均不高于0.00005%,在无高纯铑基体匹配的条件下,可满足99.99%的高纯铑测定要求。 An analytical method was proposed for the determination of16impurities in pure rhodium by inductively coupled plasma mass spectrometry(ICP-MS).These impurities include Mg,Al,Si,Mn,Fe,Ni,Cu,Zn,Ru,Ag,Pd,Sn,Ir,Pt,Au and Pb.Rhodium samples to be tested was digested by a mixture of HCl and H2O2in microwave oven.The interference of multifunctional ions to Fe and Si was eliminated by the dynamic reaction cell technology(DRC).Y,Re,Sc and In were used as internal elements for the16impurities.The recoveries and precision(RSD)were measured to be88.5%~116.2%and0.63%~13.44%,respectively.Detection limit was0.0001%for Fe,0.0005%for Si and0.00005%for other elements.The method can be applied to the analysis of99.99%high-purity rhodium,in case of no rhodium matrix matching available.
作者 任传婷 方卫 冯璐 徐光 汪原伊 李秋莹 马媛 甘建壮 俞建树 REN Chuanting;FANG Wei;FENG Lu;XU Guang;WANG Yuanyi;LI Qiuying;MA Yuan;GAN Jianzhuang;YU Jianshu(State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Sino-Platinum Metals Co.Ltd., Kunming 650106, China;GuiYan Detection Technology (Yunnan) Co. Ltd., Kunming 650106, China)
出处 《贵金属》 CAS CSCD 北大核心 2017年第3期66-71,共6页 Precious Metals
基金 基金项目:国家标准制定任务(20140931-T-610)
关键词 分析化学 纯铑 杂质元素 电感耦合等离子体质谱(ICP-MS)法 动态反应池(DRC) analytical chemistry pure rhodium impurities inductively coupled plasma mass spectrometry (ICP-MS) dynamic reaction cell (DRC)
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